Atomic layer deposition (ALD) is a thin layer deposition process that is based on the chronological exploitation of a gas phase chemical course. ALD is considered a subclass of chemical vapor deposition. The majority of ALD reactions use two chemicals,
Atomic layer deposition (ALD) is a thin layer deposition process that is based on the chronological exploitation of a gas phase chemical course. ALD is considered a subclass of chemical vapor deposition. The majority of ALD reactions use two chemicals,